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For Speakers

ValleyML presents a unique combination of AI Technology, researchers, industry elites and prospective clients in one single iconic event. It’s
the ideal platform for innovative engineers, marketing veterans, business leaders, decision makers, media analysts and investors looking to generate buzz and network. In 2021, we’re all set to host another groundbreaking virtual conference, this time with enhanced features & experiences!

We have a global outreach to close to 200,000 professionals in AI and Machine Learning. The focus areas of our members are AI Robotics, AI in Enterprise and AI Hardware. We are expecting around 5000 attendees. 
We are looking for expert speakers from the pool of technical or management leaders in machine learning and artificial intelligence in different industry verticals.

Program and speaker details will soon be displayed.

Why You Should Participate

By sharing your expertise with ValleyML industry community, you are helping the attendees to earn Continuing Education credentials from IEEE, world’s largest technical professional organization.

  • Attendees receive IEEE PDH Certificate from IEEE Continuing Education

  • IEEE Certificates guarantee that education program meets IEEE standards, and offers some of the most relevant content that engineers need to stay ahead

  • A not-for-profit organization, IEEE is the world’s largest technical professional organization dedicated to advancing technology for the benefit of humanity

  • IEEE Certificates will help technical professionals:

    • Gain a competitive advantage

    • Update their knowledge and skills

    • Build professional credibility

    • Earn the CEUs/PDHs they need to keep their licenses current

Speaker Requirements

All the speakers need to provide their

  • bio

  • photo

  • abstract (for talks) 

For Panel Talks, the panel moderator needs to provide  his/her bio along with the panel description and the bios and photos of all the panelists.

All the speakers and panelists need to electronically sign the Copyright And Consent Form.

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